Session 11: 3D Process Simulation II
Location: Conference
Room London
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15:00 |
Adaptive
Surface Triangulations for 3D Process Simulation
Nguyen,
P.-H., Burenkov, A., Lorenz, J.
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Fraunhofer
Institute of Integrated Systems and Device Technology, Germany |
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15:20
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Anisotropic
Laplace Refinement for Three-Dimensional Oxidation Simulation
Wessner,
W., Hollauer, C., Hössinger, A., Selberherr, S.
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Institute
for Microelectronics, TU Vienna, Austria |
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15:40
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Monte
Carlo Simulation of Ion Implantation in Silicon-Germanium Alloys
Wittmann,
R., Hössinger, A., Selberherr, S.
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Institute
for Microelectronics, TU Vienna, Austria |
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