The International Conference on Simulation of Semiconductor Processes and Devices (SISPAD) provides an international forum for the presentation of leading-edge research and development results in the field of process and device simulation. SISPAD is one of the longest-running conferences devoted to technology computer-aided design (TCAD) and advanced modeling of novel semiconductor devices and nano-electronic structures. The conference is held annually in September and the location alternates between the United States, Japan, and Europe.
The topics covered in SISPAD include:
The next SISPAD conference will be hosted in Dallas, Texas.
In 1996 the first SISPAD conference was held in Tokyo as the successor to three preceding conferences: